Post-doc Research Position “Hybrid metrology for XUV Optics” (Full-Time)

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The University of Twente Calls for application from a motivated and skilled post-doctoral researcher to work on the characterization of XUV optics.

These optics basically consist of optical stacks of films of nanoscale thickness and come in reflective and transmissive types. The physics and chemistry of these thin-film systems need to be controlled and characterized with atomic precision.

The aim of this research group is to develop the physics solutions for these tasks, such that new applications can be realized. These range from multi-layered optics engineered to show near-theoretical XUV reflectivity to highly transparent, few tens of nanometer-thin membranes that are robust enough to withstand high XUV power levels.

The tasks include the fine-tuning of complex optical indices by altering electronic structures, the reduction of layer roughness levels to a tenth of a nanometer, the control of thin-film stresses to below a GPA, and the limitation of thermally and chemically induced diffusion processes. These processes require new types of diagnostics with adequate resolution to film thickness and high sensitivity to chemical state.

A postdoctoral research position is open for the application and development of complex hybrid metrology with unprecedented sensitivity. At the XUV optics group, The University of Twente has a set of in-house developed and commercially available techniques for the characterization of complex nm-scale films. The applicant’s responsibility will be the development of specific metrology solutions for thin-film structures studied in the XUV Optics Group.

Vacancies

Applicants goal is to develop a thin-film characterization platform targeted to analyze various thin-film phenomena and solve the most challenging puzzles originating form the growth and application of the thin-film device, including:

  • Hybrid thin-film characterization schemes based on an efficient combination of various measurement techniques;

    • Improvement of the accuracy of both measurements and data analysis and the uniqueness of current X-ray measurements;

  • Assisting and teaching of thin-film metrology to colleagues and students in the group.
Salary
  • The post-doc salary is between € 3.353-€ 4.402,- gross pay per month depending on experience and qualifications
  • holiday allowance
  • a solid pension scheme,
  • minimum of 29 holidays, and
  • numerous professional and personal development programs.
Location: Netherland
Duration: 2 years
Job Requirements

Candidates should meet the following requirements:

  • have a Ph.D. degree in physics, materials science, physical chemistry, or engineering, related to the characterization of nanostructures and nano-metrology.
  • have evidenced experience in X-ray analysis of thin films and interfaces.
  • be knowledgeable with scientific data analysis.
  • advanced knowledge of statistical methods for data analysis is an advantage.
  • have an affinity with the development of new or extension of existing characterization techniques.
  • an excellent team player in an enthusiastic group of scientists and engineers working on a common theme.
  • be creative, like to push boundaries, and are highly motivated to address a major science challenge in thin-film metrology.
  • be fluent in English and able to collaborate intensively with industrial and academic parties in regular meetings and work visits.
Application Process

Applications should include the following documents:

  • Motivation letter, emphasizing specific interest and motivation and experience with characterization of nanomaterials (Maximum of5 A4);
  • Detailed CV,
  • Publication list,
  • Contact details of referees,
  • An academic transcript of B.Sc. and M.Sc. education;
    A pdf of your Ph.D. thesis.
  • Optionally you can include a recommendation letter from your Ph.D. supervisor.
Application Deadline: November 15, 2020

For more information and application, visit the official site

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