The Nanoscale Imaging and Metrology group, a research group in Advanced Research Center for Nanolithography (ARCNL) seeks applicants for a postdoc position in Multimode fibers for coherence tuning and wavefront control.
This two-year postdoc project is at the interface between science and applications. Accelerated technological change in the semiconductor industry is driven by the continuous reduction of feature size. Printing the smaller and smaller patterns raises more and more challenges for the wafer metrology systems.
Coherence is among the fundamental properties of light and one of the key parameters of the light sources used for metrology: while some sources are preferred to be incoherent, others have to be fully or partially coherent. Improper spatial coherence of the illumination beam may cause severe degradation in the performance of imaging and metrology sensors. A simple multimode (MM) fiber is a very promising tool for tailoring spatial coherence.
ARCNL assists any new foreign postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.
- a Ph.D. in physics, computational physics, or applied mathematics, and combine a strong theoretical foundation with an affinity for experiments and applications.
- experience in computational imaging, machine learning, modeling (optical) wave phenomena, information theory, and/or optimization algorithms.
- Knowledge of imaging technology, advanced programming methods, and/or semiconductor metrology is considered an advantage.
- Good verbal and written communication skills (in English) are required.
The following is needed for the application:
- Motivation on why they want to join the group (maximum 1 page).
- It is important for ARCNL to know why applicants want to join their team. Therefore, they will only consider applicants’ applications if it entails their motivation letter.
To apply, click here.
Application Deadline: February 28, 2021
For more information and application, visit the official site.